The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Mar. 31, 2012
Denis Bolshukhin, Goettingen, DE;
Alexander Christian Keller, Wendlingen/Neckar, DE;
Max Christian Schuermann, Luebbecke, DE;
Guido Schriever, Goettingen, DE;
Imtiaz Ahmad, San Diego, CA (US);
Juergen Kleinschmidt, Jena, DE;
Denis Bolshukhin, Goettingen, DE;
Alexander Christian Keller, Wendlingen/Neckar, DE;
Max Christian Schuermann, Luebbecke, DE;
Guido Schriever, Goettingen, DE;
Imtiaz Ahmad, San Diego, CA (US);
Juergen Kleinschmidt, Jena, DE;
XTREME technologies GmbH, Aachen, DE;
Abstract
The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.