The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Jul. 28, 2009
Hiroyuki Uesugi, Kawasaki, JP;
Hiroyuki Uesugi, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
In forming a TiN film on a base material () by a MOCVD method, a space between a showerhead () and a trapping member () is heated by a heater () up to a temperature at which TDMAT is thermally decomposed, or higher. Next, source gas containing TDMAT, and so on are emitted from the showerhead () into a chamber (). As a result, the TDMAT emitted into the chamber () is thermally decomposed into TiN, carbon, and hydrocarbon by the heater () in the space between the showerhead () and the trapping member (). Then, the TiN, carbon, and hydrocarbon move toward the base material (). Then, the carbon and hydrocarbon are trapped by the trapping member (). On the other hand, the TiN passes through the trapping member () without being trapped to reach the base material (). As a result, a TiN film containing neither carbon nor hydrocarbon grows on a surface of the base material ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile