The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2013

Filed:

Apr. 28, 2004
Applicant:

Soon-im WI, Suwon-si, KR;

Inventor:

Soon-Im Wi, Suwon-si, KR;

Assignee:

Gen Co., Ltd., Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/00 (2006.01); H01J 7/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

An inductive plasma chamber of the present invention comprises a plurality of discharge tube bridges connected between a discharge tube head and a process chamber. The discharge tube head is disc shaped and a cylindrical gas inlet which a gas is injected is disposed in its center. A susceptor on which a workpiece is placed is disposed inside a process chamber and a flange of upper certain area has an inclined surface which is upward centrally inclined. The discharge tube bridge is provided with at least one ferrite core, and the ferrite core has a winding connected to a power supply source. When a process gas is injected via the gas inlet and a RF power from the power supply source is supplied with a winding, the electromotive force is transmitted inside the discharge tube head, the discharge bridge and the process chamber so that the plasma discharge is occurred in the plasma chamber. The plasma chamber comprises a switching means enabling plasma discharge paths to be alternately formed between the plurality of discharge tube bridges. The switching means switches in a predetermined period to be alternately formed the plasma discharge paths between the plurality of discharge tube bridges. The inductive plasma chamber can obtain high-density plasma while enhancing uniformity as well as enlarging plasma volume.


Find Patent Forward Citations

Loading…