The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Sep. 12, 2011
Paul Graeupner, Aalen, DE;
Paul Graeupner, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A system and associated method employ a first projection objective including at least one optical proximity correction (OPC) filter with a filter function adapted to a particular pattern. The first projection objective has at least essentially the same imaging properties as a second projection objective in the system, for the particular pattern, to which the filter function of the optical proximity correction (OPC) filter is adapted. The first projection objective differs from the second projection objective with respect to optical imaging properties for the particular pattern when the optical proximity correction (OPC) filter is not present in the first projection objective.