The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Oct. 04, 2011
Noel Smith, Lake Oswego, OR (US);
Clive D. Chandler, Portland, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Paul P. Tesch, Portland, OR (US);
Dave Tuggle, Portland, OR (US);
Noel Smith, Lake Oswego, OR (US);
Clive D. Chandler, Portland, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Paul P. Tesch, Portland, OR (US);
Dave Tuggle, Portland, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.