The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Oct. 06, 2011
Dong-pyo Kim, Daejeon, KR;
Kyu-ha Baek, Daejeon, KR;
Kunsik Park, Daejeon, KR;
Ji Man Park, Daejeon, KR;
Zin Sig Kim, Daejeon, KR;
Joo Yeon Kim, Daejeon, KR;
YE Sul Jeong, Pohang-si, KR;
Lee-mi DO, Daejeon, KR;
Dong-Pyo Kim, Daejeon, KR;
Kyu-Ha Baek, Daejeon, KR;
Kunsik Park, Daejeon, KR;
Ji Man Park, Daejeon, KR;
Zin Sig Kim, Daejeon, KR;
Joo Yeon Kim, Daejeon, KR;
Ye Sul Jeong, Pohang-si, KR;
Lee-Mi Do, Daejeon, KR;
Electronics and Telecommunications Research Institute, Daejeon, KR;
Abstract
Provided is a method of manufacturing a via electrode by which productivity and production yield can be augmented or maximized. The method of the present invention includes: forming a via hole at a substrate; forming a catalyst layer at a sidewall and a bottom of the via hole; and forming a graphene layer in the via hole by exposing the catalyst layer to a solution mixed with graphene particles.