The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Mar. 22, 2011
Tae-ho Cha, Gyeonggi-do, KR;
Seong-hwee Cheong, Seoul, KR;
Gil-heyun Choi, Seoul, KR;
Byung-hee Kim, Seoul, KR;
Hee-sook Park, Seoul, KR;
Jong-min Baek, Seoul, KR;
Tae-Ho Cha, Gyeonggi-do, KR;
Seong-Hwee Cheong, Seoul, KR;
Gil-Heyun Choi, Seoul, KR;
Byung-Hee Kim, Seoul, KR;
Hee-Sook Park, Seoul, KR;
Jong-Min Baek, Seoul, KR;
Abstract
A gate structure includes an insulation layer on a substrate, a first conductive layer pattern on the insulation layer, a metal ohmic layer pattern on the first conductive layer pattern, a diffusion reduction layer pattern on the metal ohmic layer pattern an amorphous layer pattern on the diffusion reduction layer pattern, and a second conductive layer pattern on the amorphous layer pattern. The gate structure may have a low sheet resistance and desired thermal stability.