The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Sep. 28, 2010
Applicants:
Steven R. J. Brueck, Albuquerque, NM (US);
Deying Xia, Albuquerque, NM (US);
Inventors:
Steven R. J. Brueck, Albuquerque, NM (US);
Deying Xia, Albuquerque, NM (US);
Assignee:
STC.UNM, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 61/00 (2006.01); B01D 63/00 (2006.01); B01D 67/00 (2006.01); B01D 69/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.