The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2013

Filed:

Jun. 27, 2006
Applicants:

Makato Kamogawa, Omura, JP;

Koichi Shimomura, Omura, JP;

Yoshiyuki Suzuki, Omura, JP;

Daisuke Ebi, Omura, JP;

Inventors:

Makato Kamogawa, Omura, JP;

Koichi Shimomura, Omura, JP;

Yoshiyuki Suzuki, Omura, JP;

Daisuke Ebi, Omura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 35/00 (2006.01); C30B 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A velocity of Ar gas flow passing through between a lower end of a cylindrical body and a thermal shielding body is influenced by arrangement of a pulling path of single crystal silicon, a cylindrical body, and a thermal shielding body. Accordingly, the velocity of the Ar gas flow passing through between a lower end of the cylindrical body and the thermal shielding body is controlled by adjusting a relative position of the pulling path of the single crystal silicon, the cylindrical body, and the thermal shielding body. As described above, dust falling off to silicon melt can be reduced, thereby preventing deterioration in quality of the single crystal silicon.


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