The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8400612 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 19, 2013

Filed:

Jun. 04, 2010
Applicants:

Kazuki Yamamoto, Shimotsuke, JP;

Yoshinori Ohsaki, Utsunomiya, JP;

Inventors:

Kazuki Yamamoto, Shimotsuke, JP;

Yoshinori Ohsaki, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.


Find Patent Forward Citations

Yamamoto, Kazuki. (2013). Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device (U.S. Patent No. 8400612). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8400612

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…