The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Jun. 07, 2005
John E. Sergi, Franklin, MA (US);
John Gaudreau, Chepachet, RI (US);
Oleg P. Kishkovich, Greenville, RI (US);
William Goodwin, Medway, MA (US);
Devon A. Kinkead, Holliston, MA (US);
John E. Sergi, Franklin, MA (US);
John Gaudreau, Chepachet, RI (US);
Oleg P. Kishkovich, Greenville, RI (US);
William Goodwin, Medway, MA (US);
Devon A. Kinkead, Holliston, MA (US);
Entegris, Inc., Billerica, MA (US);
Abstract
The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.