The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2013

Filed:

Jan. 30, 2012
Applicants:

Marcus Theodoor Wilhelmus Van Der Heijden, Dilsen-Stokkem, BE;

Marco Koert Stavenga, Eindhoven, NL;

Patrick Wong, Schilde, BE;

Frederik Johannes Van Den Bogaard, Eindhoven, NL;

Dirk DE Vries, Eindhoven, NL;

David Bessems, Eindhoven, NL;

Jacques Roger Alice Mycke, Maastricht, NL;

Inventors:

Marcus Theodoor Wilhelmus Van Der Heijden, Dilsen-Stokkem, BE;

Marco Koert Stavenga, Eindhoven, NL;

Patrick Wong, Schilde, BE;

Frederik Johannes Van Den Bogaard, Eindhoven, NL;

Dirk De Vries, Eindhoven, NL;

David Bessems, Eindhoven, NL;

Jacques Roger Alice Mycke, Maastricht, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.


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