The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2013

Filed:

May. 16, 2011
Applicant:

Hidetaka Sawada, Tokyo, JP;

Inventor:

Hidetaka Sawada, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01);
U.S. Cl.
CPC ...
Abstract

A spherical aberration corrector and method is offered, which is easy to design and which can correct spherical aberration and even six-fold astigmatism in a charged particle beam instrument. The corrector has a first pair of multipole elements for producing a first pair of three-fold symmetric fields in which three-fold astigmatisms produced mutually are canceled out and a second pair of multipole elements for producing a second pair of three-fold symmetric fields in which three-fold astigmatisms produced mutually are canceled out. The second pair of multipole elements produce six-fold astigmatisms angularly spaced by 30° about an optical axis from six-fold astigmatisms produced by the first pair of multipole elements.


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