The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Jan. 22, 2009
Rikimaru Kuwabara, Chuo-ku, JP;
Takahiro Okamoto, Chuo-ku, JP;
Yukio Hosaka, Chuo-ku, JP;
Takafumi Shimizu, Chuo-ku, JP;
Tsuyoshi Watanabe, Chuo-ku, JP;
Rikimaru Kuwabara, Chuo-ku, JP;
Takahiro Okamoto, Chuo-ku, JP;
Yukio Hosaka, Chuo-ku, JP;
Takafumi Shimizu, Chuo-ku, JP;
Tsuyoshi Watanabe, Chuo-ku, JP;
JSR Corporation, Tokyo, JP;
Abstract
A composition for forming a chemical mechanical polishing pad having polishing characteristics such as a high polishing rate, an excellent planarity of the polished object, and less scratches of the polished object. The composition includes (A) a polyurethane having a carbon-carbon double bond on a side chain and (B) a cross-linking agent. The polyurethane (A) is preferably a thermoplastic polyurethane (A') obtained by mixing at least components (a11) to (a13) and component (a2) in a proportion satisfying the following conditions (1) and (2) and reacting them.