The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Oct. 07, 2010
Michel Despont, Adliswil, CH;
Urs T. Duerig, Rueschlikon, CH;
Jane E. Frommer, San Jose, CA (US);
Bernd W. Gotsmann, Horgen, CH;
James L. Hedrick, Pleasanton, CA (US);
Craig Jon Hawker, Los Gatos, CA (US);
Robert D. Miller, San Jose, CA (US);
Michel Despont, Adliswil, CH;
Urs T. Duerig, Rueschlikon, CH;
Jane E. Frommer, San Jose, CA (US);
Bernd W. Gotsmann, Horgen, CH;
James L. Hedrick, Pleasanton, CA (US);
Craig Jon Hawker, Los Gatos, CA (US);
Robert D. Miller, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.