The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Oct. 21, 2009
Applicant:
Shinichiro Koga, Utsunomiya, JP;
Inventor:
Shinichiro Koga, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G01N 21/86 (2006.01); G03B 27/32 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure apparatus includes a controller configured to calculate a position of an alignment mark detected by a detector, to approximate a deformation of a substrate by using an approximation equation, to calculate a correction amount of each of the plurality of shots, and to control driving of a stage in exposing each shot based on a correction amount that is calculated. The approximation equation is defined as a sum of a first term representative of a deformation of the entire substrate, and at least one of a second term representative of a distortion of a shot arrangement and a third term representative of a shot shape.