The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2013

Filed:

Jun. 16, 2009
Applicants:

Rainer Knippelmeyer, Munich, DE;

Lawrence Scipioni, Bedford, MA (US);

Christoph Riedesel, Aalen, DE;

John Morgan, Marblehead, MA (US);

Ulrich Mantz, Schelklingen, DE;

Ulrich Wagemann, Aalen, DE;

Inventors:

Rainer Knippelmeyer, Munich, DE;

Lawrence Scipioni, Bedford, MA (US);

Christoph Riedesel, Aalen, DE;

John Morgan, Marblehead, MA (US);

Ulrich Mantz, Schelklingen, DE;

Ulrich Wagemann, Aalen, DE;

Assignee:

Carl Zeiss NTS, LLC, Peabody, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/28 (2006.01); G01N 23/00 (2006.01); H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A first instrument () is used to image a first semiconductor article having a trench () of defined cross-section, while a second instrument () is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench () of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.


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