The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Nov. 16, 2010
Applicants:
Tuung Luoh, Hsin-chu, TW;
Ling-wu Yang, Hsin-chu, TW;
Tahone Yang, Hsin-chu, TW;
Kuang-chao Chen, Hsin-chu, TW;
Inventors:
Tuung Luoh, Hsin-chu, TW;
Ling-Wu Yang, Hsin-chu, TW;
Tahone Yang, Hsin-chu, TW;
Kuang-Chao Chen, Hsin-chu, TW;
Assignee:
Macronix International Co., Ltd., Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
The method of forming a wordline is provided in the present invention. The proposed method includes steps of: (a) providing a plurality of SASTIs with a plurality of first POLY cells deposited thereon; and (b) depositing a first fill-in material having a relatively high etching rate oxide-like material in the plurality of SASTIs and on each side wall of the plurality of first POLY cells.