The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Feb. 22, 2010
Keiji Matsumoto, Yokohama, JP;
Shuji Koyama, Kawasaki, JP;
Hiroyuki Abo, Tokyo, JP;
Keiji Watanabe, Kawasaki, JP;
Keiji Matsumoto, Yokohama, JP;
Shuji Koyama, Kawasaki, JP;
Hiroyuki Abo, Tokyo, JP;
Keiji Watanabe, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of manufacturing a substrate for a liquid discharge head, the substrate being a silicon substrate having a first surface opposed to a second surface, the method comprising the steps of providing a layer on the second surface of the silicon substrate, wherein the layer has a lower etch rate than silicon when exposed to an etchant of silicon, partially removing the layer so as to expose part of the second surface of the silicon substrate, wherein the exposed part surrounds at least one part of the layer; and wet etching the layer and the exposed part of the second surface of the silicon substrate, using the etchant of silicon, to form a liquid supply port extending from the second surface to the first surface of the silicon substrate.