The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Nov. 05, 2010
Yoshiaki Yamada, Tokyo, JP;
Yuichi Yamamoto, Tokyo, JP;
Hitoshi Kosugi, Kumamoto, JP;
Seiji Fujimoto, Koshi, JP;
Yoshiaki Yamada, Tokyo, JP;
Yuichi Yamamoto, Tokyo, JP;
Hitoshi Kosugi, Kumamoto, JP;
Seiji Fujimoto, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A photoresist coating and developing apparatusincludes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unitthat heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber Lthat unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer devicethat transfers the substrate from the heating unitto the load-lock chamber L