The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Feb. 25, 2011
Hyun-woo Chung, Seoul, KR;
Hui-jung Kim, Seongnam-si, KR;
Yongchul OH, Suwon-si, KR;
Hyun-gi Kim, Hwaseong-si, KR;
Kang-uk Kim, Seoul, KR;
Hyun-Woo Chung, Seoul, KR;
Hui-Jung Kim, Seongnam-si, KR;
Yongchul Oh, Suwon-si, KR;
Hyun-Gi Kim, Hwaseong-si, KR;
Kang-Uk Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Provided are a vertical channel transistor and a method for fabricating a vertical channel transistor. The method includes forming an active layer on a substrate, forming a plurality of vertical channels on the active layer, forming a plurality of isolated gate electrodes to surround sidewalls of the plurality of vertical channels, forming a buried bitline to extend along the active layer between the plurality of vertical channels, forming a plug-in between the plurality of vertical channels to connect the plurality of isolated gate electrodes and forming a wordline on a location where the plug-in and the plurality of isolated gate electrodes are connected.