The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2013

Filed:

Jul. 06, 2006
Applicants:

Shuji Nakamura, Santa Barbara, CA (US);

Steven Denbaars, Goleta, CA (US);

Max Batres, Santa Barbara, CA (US);

Michael Coulter, Santa Barbara, CA (US);

Inventors:

Shuji Nakamura, Santa Barbara, CA (US);

Steven DenBaars, Goleta, CA (US);

Max Batres, Santa Barbara, CA (US);

Michael Coulter, Santa Barbara, CA (US);

Assignee:

Cree, Inc., Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 14/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A susceptor for holding semiconductor wafers in an MOCVD reactor during growth of epitaxial layers on the wafers is disclosed. The susceptor comprises a base structure made of a material having low thermal conductivity at high temperature, and has one or more plate holes to house heat transfer plugs. The plugs are made of a material with high thermal conductivity at high temperatures to transfer heat to the semiconductor wafers. A metalorganic chemical vapor deposition reactor is also disclosed utilizing a susceptor according to the present invention.

Published as:
US2003209719A1; CA2484700A1; WO03098667A1; AU2003234333A1; TW200405394A; KR20040108785A; EP1504463A1; JP2005526394A; CN1669117A; US7122844B2; US2006269390A1; JP5001516B2; US8372204B2;

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