The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Nov. 02, 2009
Motonori Nakamura, Omura, JP;
Yoshinobu Mori, Omura, JP;
Takeshi Masuda, Omura, JP;
Hidenori Kobayashi, Omura, JP;
Kazuhiro Narahara, Omura, JP;
Motonori Nakamura, Omura, JP;
Yoshinobu Mori, Omura, JP;
Takeshi Masuda, Omura, JP;
Hidenori Kobayashi, Omura, JP;
Kazuhiro Narahara, Omura, JP;
Sumco Techxiv Corporation, Nagasaki, JP;
Abstract
In a manufacturing apparatus for manufacturing an epitaxial wafer with a wafer being mounted substantially concentrically with a susceptor, a center rod is provided to extend in an up-and-down direction on a side of a non-mounting surface of the susceptor so that its upper end is adjacent to the center of the susceptor. With this arrangement, part of radiation light irradiated toward the susceptor is diffusely reflected by the center rod before reaching the central portion of the susceptor, thereby reducing the amount of the radiation light irradiated to the central portion of the susceptor as well as lowering the temperature of the portion. Since the center rod and the susceptor are not in surface contact, the center rod does not take the heat from the susceptor, thereby suppressing the temperature from decreasing locally at the central portion of the susceptor.