The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2013

Filed:

Dec. 11, 2009
Applicants:

Ali Afzali-ardakani, Ossining, NY (US);

Emanuel Israel Cooper, Scarsdale, NY (US);

Mahmoud Khojasteh, Poughkeepsie, NY (US);

Ronald W. Nunes, Hopewell Junction, NY (US);

George Gabriel Totir, Newtown, CT (US);

Inventors:

Ali Afzali-Ardakani, Ossining, NY (US);

Emanuel Israel Cooper, Scarsdale, NY (US);

Mahmoud Khojasteh, Poughkeepsie, NY (US);

Ronald W. Nunes, Hopewell Junction, NY (US);

George Gabriel Totir, Newtown, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cerium. The cerium may be comprised in a salt. The salt may be cerium ammonium nitrate.


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