The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Jan. 20, 2011
Applicants:

Xiao Yang, Cupertino, CA (US);

William Spencer Worley, Iii, Half Moon Bay, CA (US);

Dongmin Chen, Saratoga, CA (US);

YE Wang, Cupertino, CA (US);

Inventors:

Xiao Yang, Cupertino, CA (US);

William Spencer Worley, III, Half Moon Bay, CA (US);

Dongmin Chen, Saratoga, CA (US);

Ye Wang, Cupertino, CA (US);

Assignee:

Miradia Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

A MEMS mirror for a laser printing application includes providing a CMOS substrate including a pair of electrodes, and providing a reflecting mirror moveable over the substrate and the electrodes. Voltages applied to the electrodes create an electrostatic force causing an end of the mirror to be attracted to the substrate. A precise position of the mirror can be detected and controlled by sensing a change in capacitance between the mirror ends and the underlying electrodes.


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