The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2013

Filed:

Jan. 15, 2010
Applicants:

Ki-chul Kim, Seongnam-si, KR;

Youn-soo Kim, Yongin-si, KR;

Ki-vin Im, Seongnam-si, KR;

Cha-young Yoo, Suwon-si, KR;

Jong-cheol Lee, Seoul, KR;

Ki-yeon Park, Seoul, KR;

Hoon-sang Choi, Seoul, KR;

Se-hoon OH, Hwaseong-si, KR;

Inventors:

Ki-chul Kim, Seongnam-si, KR;

Youn-soo Kim, Yongin-si, KR;

Ki-vin Im, Seongnam-si, KR;

Cha-young Yoo, Suwon-si, KR;

Jong-cheol Lee, Seoul, KR;

Ki-yeon Park, Seoul, KR;

Hoon-sang Choi, Seoul, KR;

Se-hoon Oh, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/322 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are methods of removing water adsorbed or bonded to a surface of a semiconductor substrate, and methods of depositing an atomic layer using the method of removing water described herein. The method of removing water includes applying a chemical solvent to the surface of a semiconductor substrate, and removing the chemical solvent from the surface of the semiconductor substrate.


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