The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
Oct. 21, 2009
Miwa Watai, Sammu, JP;
Kazuya Saito, Sammu, JP;
Takashi Komatsu, Sammu, JP;
Yusuke Mizuno, Sammu, JP;
Atsushi Ota, Sammu, JP;
Shunji Kuroiwa, Sammu, JP;
Miwa Watai, Sammu, JP;
Kazuya Saito, Sammu, JP;
Takashi Komatsu, Sammu, JP;
Yusuke Mizuno, Sammu, JP;
Atsushi Ota, Sammu, JP;
Shunji Kuroiwa, Sammu, JP;
Ulvac, Inc., Chigasaki-Shi, JP;
Abstract
A mask includes: a tabular first section which includes a side portion and an opening portion formed at a position corresponding to a film formation region of a substrate and on which the substrate is to be disposed so that the first section overlaps a face of the substrate on which a film is to be formed; and a second section which is provided along the side portion of the first section, and covers at least one of portions of a side face of the substrate, wherein second sections of two adjacent masks overlap each other and a superposed section is thereby formed when a plurality of masks are arrayed in a lateral direction thereof.