The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2012

Filed:

Oct. 20, 2010
Applicant:

Francis Reilly, Bayport, NY (US);

Inventor:

Francis Reilly, Bayport, NY (US);

Assignee:

Ceres Technologies, Inc., Saugerties, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/223 (2006.01);
U.S. Cl.
CPC ...
Abstract

An X-ray metrology system for a vacuum deposition chamber includes a vacuum interface assembly mounted through an aperture in the exterior wall of the chamber and extending into the interior of the chamber. The interface assembly is formed from a housing having side walls and a bottom forming an interior chamber, and an X-ray port mounted in an aperture in the bottom of the housing. The X-ray port has two apertures therethrough, with each aperture being covered by a window of beryllium. An X-ray metrology machine having a generator and detector is disposed within the housing, and the apertures in the X-ray port are arranged so that X-rays generated by the generator pass through one of the apertures, and X-rays fluorescing off of a substrate in the deposition chamber travel through the other aperture to the detector.


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