The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2012

Filed:

Apr. 06, 2011
Applicants:

Manfred Engelhardt, Villach-Landskorn, AT;

Hans-joerg Timme, Ottobrunn, DE;

Ivan Nikitn, Regensburg, DE;

Manfred Frank, Nittendorf, DE;

Thomas Kunstmann, Laaber, DE;

Werner Robl, Regensburg, DE;

Guenther Ruhl, Regensburg, DE;

Inventors:

Manfred Engelhardt, Villach-Landskorn, AT;

Hans-Joerg Timme, Ottobrunn, DE;

Ivan Nikitn, Regensburg, DE;

Manfred Frank, Nittendorf, DE;

Thomas Kunstmann, Laaber, DE;

Werner Robl, Regensburg, DE;

Guenther Ruhl, Regensburg, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to various embodiments, a method for processing a semiconductor wafer or die is provided including supplying particles to a plasma such that the particles are activated by the plasma and spraying the activated particles on the semiconductor wafer or die to generate a particle layer on the semiconductor wafer or die.


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