The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Feb. 10, 2011
Jun Sato, Nirasaki, JP;
Eiji Kikama, Nirasaki, JP;
Masataka Toiya, Oshu, JP;
Tetsuya Shibata, Nirasaki, JP;
Jun Sato, Nirasaki, JP;
Eiji Kikama, Nirasaki, JP;
Masataka Toiya, Oshu, JP;
Tetsuya Shibata, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A film formation method includes a film formation process for forming an SiOfilm on a surface of a target object inside a process container by use of an Si source gas and an oxidizing agent, and an oxidation purge process for performing oxidation on films deposited inside the process container while exhausting gas from inside the process container after unloading the target object from the process container, wherein the film formation process and the oxidation purge process are alternately repeated a plurality of times without, interposed therebetween, a process for removing the films deposited inside the process container.