The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Mar. 17, 2011
Takafumi Taguchi, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Hiromitsu Mashita, Kanagawa, JP;
Fumiharu Nakajima, Kanagawa, JP;
Ryota Aburada, Kanagawa, JP;
Chikaaki Kodama, Kanagawa, JP;
Takafumi Taguchi, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Hiromitsu Mashita, Kanagawa, JP;
Fumiharu Nakajima, Kanagawa, JP;
Ryota Aburada, Kanagawa, JP;
Chikaaki Kodama, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern dimension calculation method according to one embodiment calculates a taper shape of a mask member used as a mask when a circuit pattern is processed in an upper layer of the circuit pattern formed on a substrate. The method calculates an opening angle facing the mask member from a shape prediction position on the circuit pattern on the basis of the taper shape. The method calculates a dimension of the circuit pattern according to the opening angle formed at the shape prediction position.