The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Mar. 01, 2011
Desmond Allen Kaplan, Billerica, MA (US);
Andreas Brekenfeld, Bremen, DE;
Christoph Gebhardt, Bremen, DE;
Ralf Hartmer, Hamburg, DE;
Desmond Allen Kaplan, Billerica, MA (US);
Andreas Brekenfeld, Bremen, DE;
Christoph Gebhardt, Bremen, DE;
Ralf Hartmer, Hamburg, DE;
Bruker Daltonik GmbH, Bremen, DE;
Abstract
In an RF quadrupole ion trap having electrodes to which RF voltages are applied, ions having m/z ratios outside of a predefined narrow range of charge-related masses m/z are removed from the trap by applying a DC voltage pulse to at least one of the trap electrodes to remove from the trap the ions with high values of charge-related masses. The DC voltage pulse is preferably applied in combination with a variation of the RF voltage amplitudes to simultaneously remove from the trap ions of low charge-related masses. The DC and RF voltage amplitudes are changed in such a manner that any excitation of ions having charge-related masses within the predefined range by frequency mixtures is avoided.