The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Nov. 06, 2009
Joy Cheng, San Jose, CA (US);
Ho-cheol Kim, San Jose, CA (US);
Hiroshi Ito, San Jose, CA (US);
Atsuko Ito, Legal Representative, San Jose, CA (US);
Hoa D. Truong, San Jose, CA (US);
Joy Cheng, San Jose, CA (US);
Ho-Cheol Kim, San Jose, CA (US);
Hiroshi Ito, San Jose, CA (US);
Atsuko Ito, legal representative, San Jose, CA (US);
Hoa D. Truong, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile