The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Mar. 04, 2008
Holger Birk, Meckesheim, DE;
Marcus Dyba, Mannheim, DE;
Hilmar Gugel, Dossenheim, DE;
Volker Seyfried, Nussloch, DE;
Holger Birk, Meckesheim, DE;
Marcus Dyba, Mannheim, DE;
Hilmar Gugel, Dossenheim, DE;
Volker Seyfried, Nussloch, DE;
Leica Microsystems CMS GmbH, Wetzlar, DE;
Abstract
A device for beam adjustment in an optical beam path, having at least two mutually independent light sources providing respective beams of a high or extremely high resolution microscope, the beams of the light sources superposed in a common illumination beam path. The device includes a calibration sample with the aid of which the pupil position and/or focal position of the beams can be checked. The device also includes a sample holder arranged to bring the calibration sample into and out of the common illumination beam path at the site or in the vicinity of an intermediate image. A corresponding method is described. In accordance with the device and method, it is possible to undertake the beam adjustment independently of the actual use, that is to say, in the case of a high resolution microscope, independently of the examination sample and/or the recording of images.