The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2012

Filed:

Nov. 17, 2010
Applicants:

Yi Cui, Sunnyvale, CA (US);

Jia Zhu, Stanford, CA (US);

Ching-mei Hsu, Stanford, CA (US);

Stephen T. Connor, San Francisco, CA (US);

Zongfu Yu, Stanford, CA (US);

Shanhui Fan, Stanford, CA (US);

George Burkhard, Palo Alto, CA (US);

Inventors:

Yi Cui, Sunnyvale, CA (US);

Jia Zhu, Stanford, CA (US);

Ching-Mei Hsu, Stanford, CA (US);

Stephen T. Connor, San Francisco, CA (US);

Zongfu Yu, Stanford, CA (US);

Shanhui Fan, Stanford, CA (US);

George Burkhard, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming a substrate comprising nanometer-scale pillars or cones that project from the surface of the substrate is disclosed. The method enables control over physical characteristics of the projections including diameter, sidewall angle, and tip shape. The method further enables control over the arrangement of the projections including characteristics such as center-to-center spacing and separation distance.


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