The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2012

Filed:

May. 20, 2008
Applicants:

Jeffrey H. Tokie, Scandia, MN (US);

Michael A. Haase, St. Paul, MN (US);

Robert J. Schubert, Cedar Park, TX (US);

Michael W. Bench, Eagan, MN (US);

Donald J. Mcclure, Siren, WI (US);

Grace L. Ho, Shanghai, CN;

Inventors:

Jeffrey H. Tokie, Scandia, MN (US);

Michael A. Haase, St. Paul, MN (US);

Robert J. Schubert, Cedar Park, TX (US);

Michael W. Bench, Eagan, MN (US);

Donald J. McClure, Siren, WI (US);

Grace L. Ho, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 27/12 (2006.01); H01L 29/49 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for forming gate structures is described. A web comprises a substrate, a plurality of conductive elements disposed on the substrate, and a conductive anodization bus. The web is moved through an anodization station to form a plurality of gate structures comprising a plurality of gate dielectrics adjacent to a plurality of gate electrodes. A process for forming electronic devices further providing a semiconductor, a source electrode, and a drain electrode is described.


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