The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2012
Filed:
Jan. 27, 2012
Makoto Sakuma, Yokohama, JP;
Takuya Futatsuyama, Yokohama, JP;
Makoto Sakuma, Yokohama, JP;
Takuya Futatsuyama, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A manufacturing method for a semiconductor memory having a memory cell area, a peripheral area and a boundary area having a specific width provided therebetween, including performing a first exposure to the memory cell array area using a first mask formed of a first patterned transparent substrate and a first light shielding portion provided on the first transparent substrate and positioned above the peripheral circuit area; and performing a second exposure to the peripheral circuit area using a second mask including a second patterned transparent substrate and a second light shielding portion positioned above the memory cell array area. The first and second masks have respective first and second unpatterned areas positioned above the peripheral circuit and boundary areas, and the memory cell array area, respectively, the first and the second exposures forming a same wiring layer above the semiconductor substrate.