The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2012
Filed:
Dec. 11, 2009
Applicants:
Seiichiro Tachibana, Joetsu, JP;
Kazumi Noda, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Inventors:
Seiichiro Tachibana, Joetsu, JP;
Kazumi Noda, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/40 (2006.01); C08L 31/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A composition comprising (A) a fluorinated polymer having k=0.01-0.4 and n=1.4-2.1 and (B) an aromatic ring-bearing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate.