The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2012
Filed:
Mar. 23, 2009
Il-kwang Yang, Yongin-si, KR;
Il-Kwang Yang, Yongin-si, KR;
Eugene Technology Co., Ltd., Yongin-si, KR;
Abstract
Disclosed is a substrate processing apparatus and method. The substrate processing apparatus includes a chamber () providing an internal space, in which a process is carried out onto a substrate; a gas supply unit () supplying a source gas to the internal space; a coil () generating an electric field in the internal space to generate plasma from the source gas; and an adjustment ring () disposed on a flow path of the plasma toward a support member to adjust the flow of the plasma. The chamber () includes a process chamber (), in which the support member is provided and the process is carried out by the plasma; and a generation chamber (), in which the plasma is generated by the coil (), provided on the upper surface of the process chamber (), and the adjustment ring () is installed at the lower end of the generation chamber ().