The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2012

Filed:

Feb. 28, 2008
Applicants:

Guray Tas, Flanders, NJ (US);

Sean P. Leary, Saraburi, TH;

Dario Alliata, Viterbo, IT;

Jana Clerico, Stanhope, NJ (US);

Priya Mukundhan, Lake Hopatcong, NJ (US);

Zhongning Dai, Bridgewater, NJ (US);

Inventors:

Guray Tas, Flanders, NJ (US);

Sean P. Leary, Saraburi, TH;

Dario Alliata, Viterbo, IT;

Jana Clerico, Stanhope, NJ (US);

Priya Mukundhan, Lake Hopatcong, NJ (US);

Zhongning Dai, Bridgewater, NJ (US);

Assignee:

Rudolph Technologies, Inc., Flanders, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 29/24 (2006.01); G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for evaluating a manufacturing process is described. The method includes generating an optical pump beam pulse and directing the optical pump beam pulse to a surface of a sample. A probe pulse is generated and directed the probe pulse to the surface of the sample. A probe pulse response signal is detected. A change in the probe pulse varying in response to the acoustic signal forms the probe pulse response signal. An evaluation of one or more manufacturing process steps used to create the sample is made based upon the probe pulse response signal. Additionally the method may be used for process control of a CMP process. Apparatus are also described.


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