The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2012

Filed:

Feb. 01, 2010
Applicants:

Ming DE Wang, Naugatuck, CT (US);

Steven A. Castaldi, Torrington, CT (US);

Kesheng Feng, Cheshire, CT (US);

Inventors:

Ming De Wang, Naugatuck, CT (US);

Steven A. Castaldi, Torrington, CT (US);

Kesheng Feng, Cheshire, CT (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/316 (2006.01); C04B 28/36 (2006.01); C04B 37/00 (2006.01); C08J 5/12 (2006.01); C08J 3/09 (2006.01); B41J 2/16 (2006.01); B32B 7/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of increasing adhesion between a copper or copper alloy layer and a polymeric resin. The method includes the steps of a) applying a pre-dip composition to the copper layer; b) applying a nano-oxide composition to the treated copper layer, c) applying a post-dip composition to the nano-oxide treated surface, and d) bonding a resin to the treated copper surface. The nano-oxide composition comprises (i) a chlorite; (ii) a caustic; (iii) a phosphate salt; (iv) an organic nitro compound; and (v) a thio compound. The post-dip composition is an alkaline solution that comprises (i) a phosphate salt; (ii) a source of molybdenum ions; and (iii) a thiazole. The process of the invention is useful for improving the bond between copper and a resin, including high Tg resins, halogen-free resins, and high speed/lost resins.


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