The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Apr. 08, 2010
Shinichiro Koga, Utsunomiya, JP;
Noburu Takakura, Utsunomiya, JP;
Shinichiro Koga, Utsunomiya, JP;
Noburu Takakura, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
An exposure apparatus sequentially transfers a pattern of an original to a plurality of shot regions on a substrate, wherein each shot region includes a chip region and a scribe line region surrounding the chip region. The apparatus includes a detector configured to detect light beams from a first mark and a second mark arranged in a first scribe line region and a second scribe line region, respectively, adjacent to each other on the substrate driven in a measurement scanning direction by substantially simultaneously observing the first scribe line region and the second scribe line region, and a processor configured to process detection signals output from the detector to determine positions of the first mark and the second mark, wherein the substrate is positioned based on the positions of the first mark and the second mark and is exposed.