The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2012

Filed:

May. 10, 2006
Applicants:

Atsushi Kazuno, Osaka, JP;

Kazuyuki Ogawa, Osaka, JP;

Masahiko Nakamori, Ohtsu, JP;

Takatoshi Yamada, Ohtsu, JP;

Tetsuo Shimomura, Osaka, JP;

Inventors:

Atsushi Kazuno, Osaka, JP;

Kazuyuki Ogawa, Osaka, JP;

Masahiko Nakamori, Ohtsu, JP;

Takatoshi Yamada, Ohtsu, JP;

Tetsuo Shimomura, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 18/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing pad generates very few scratches on a surface of a polishing object, and is excellent in planarization property. The polishing pad has a high polishing rate and is excellent in planarization property. The polishing pad grooves become very little clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, the polishing rate is scarcely reduced.


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