The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Mar. 08, 2010
Dmitriy Shneyder, Hopewell Junction, NY (US);
Srinivasan Rangarajan, Hopewell Junction, NY (US);
Michael J. Shapiro, Hopewell Junction, NY (US);
Anthony K. Stamper, Hopewell Junction, NY (US);
Huilong Zhu, Poughkeepsie, NY (US);
Dmitriy Shneyder, Hopewell Junction, NY (US);
Srinivasan Rangarajan, Hopewell Junction, NY (US);
Michael J. Shapiro, Hopewell Junction, NY (US);
Anthony K. Stamper, Hopewell Junction, NY (US);
Huilong Zhu, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of aligning substrates, e.g., semiconductor wafers, is provided in which a first substrate can be at least coarsely aligned atop a second substrate. Each substrate can have a pattern thereon, wherein the pattern of the first substrate can be aligned with a window of the first substrate. A return signal can be returned from simultaneously illuminating the patterns of the first and second substrates through the window in the first substrate. The return signal can be compared to at least one stored signal to determine relative misalignment between the first and second substrates. A position of at least one of the first and second substrates can be altered relative to a position of the other of the first and second substrates to address the misalignment.