The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2012

Filed:

Feb. 24, 2010
Applicants:

Po-fu Chou, Taoyuan County, TW;

Yu-wen Liu, Hsinchu County, TW;

Inventors:

Po-Fu Chou, Taoyuan County, TW;

Yu-Wen Liu, Hsinchu County, TW;

Assignee:

United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for staining a sample includes the following steps. A test device is provided. The test device is sampled to obtain a sample. The sample includes a substrate, an active area disposed within the substrate and having a first doped substrate region and a second doped substrate region, at least one gate disposed between the first doped substrate region and the second doped substrate region, and an exposed shallow trench isolation embedded in the substrate and surrounding the active area. A first staining procedure is then carried out to selectively remove the shallow trench isolation to form a first void and to entirely expose the active area. A second staining procedure is subsequently carried out to selectively stain the first doped substrate region and the second doped substrate region to form a second void.


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