The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Jan. 31, 2011
Masahiko Minemura, Yokohama, JP;
Seiji Makino, Yokohama, JP;
Kanji Takeuchi, Yokohama, JP;
Noboru Sugiyama, Yokohama, JP;
Kozo Ogino, Yokohama, JP;
Masahiko Minemura, Yokohama, JP;
Seiji Makino, Yokohama, JP;
Kanji Takeuchi, Yokohama, JP;
Noboru Sugiyama, Yokohama, JP;
Kozo Ogino, Yokohama, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.