The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2012

Filed:

Sep. 26, 2007
Applicants:

Sébastien Le Floch, St. Imier, CH;

Yves Salvade, St. Imier, CH;

Thomas Jensen, Rorschach, CH;

Marcel Rohner, Heiden, CH;

Inventors:

Sébastien Le Floch, St. Imier, CH;

Yves Salvade, St. Imier, CH;

Thomas Jensen, Rorschach, CH;

Marcel Rohner, Heiden, CH;

Assignee:

Leica Geosystems AG, Heerbrugg, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); H01S 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method for generating a synthetic wavelength, particularly for an interferometric distance measuring setup, with a primary laser source defining a primary frequency υand at least a first sideband frequency υof the primary frequency υ, laser radiation with the first sideband frequency υand a corresponding first wavelength is provided wherein the first sideband frequency υis continuously shifted, particularly by modulating the primary laser source. The synthetic wavelength is generated by combining the first wavelength and a second wavelength which is defined by the primary laser source, particularly by superposition.


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