The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
May. 14, 2008
Hiroyuki Mishima, Hitachinaka, JP;
Hiroaki Ishizawa, Hitachinaka, JP;
Masashi Endo, Hitachinaka, JP;
Hiroyuki Mishima, Hitachinaka, JP;
Hiroaki Ishizawa, Hitachinaka, JP;
Masashi Endo, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention provides a highly reliable reaction cuvette in which air bubbles are adhered little and mutual contamination can be prevented among samples and reagents in adjoining reaction cuvettes, a method of surface treatment for a reaction cuvette, and an automatic analyzer with the reaction cuvette mounted therein. The reaction cuvette according to the present invention, in which a sample and a reagent are mixed with each other and its concentration is measured, has an area subjected to hydrophilic treatment by electric discharging on inner and outer surfaces of the reaction cuvette. Further the reaction cuvette has a container-like form with its upper portion opened to provide an opening and its lower portion closed to provide a bottom. The hydrophilic area is present from a bottom of the reaction cuvette up to a midway to the opening.