The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Feb. 26, 2008
Jun Hatakeyama, Niigata, JP;
Kazumi Noda, Niigata, JP;
Seiichiro Tachibana, Niigata, JP;
Takeshi Kinsho, Niigata, JP;
Tsutomu Ogihara, Niigata, JP;
Jun Hatakeyama, Niigata, JP;
Kazumi Noda, Niigata, JP;
Seiichiro Tachibana, Niigata, JP;
Takeshi Kinsho, Niigata, JP;
Tsutomu Ogihara, Niigata, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A resist lower layer film composition, wherein an etching speed is fast, thus an etching time period can be shortened to minimize a film thickness loss of a resist pattern and a deformation of the pattern during etching, therefore, a pattern can be transferred with high accuracy and an excellent pattern can be formed on a substrate is provided. The resist lower layer film composition comprising at least a polymer having a repeating unit represented by the following general formula (1).