The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2012
Filed:
May. 24, 2010
Sven Beyer, Dresden, DE;
Berthold Reimer, Dresden, DE;
Falk Graetsch, Dresden, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
A gate electrode structure may be formed on the basis of a silicon nitride cap material in combination with a very thin yet uniform silicon oxide based etch stop material, which may be formed on the basis of a chemically driven oxidation process. Due to the reduced thickness, a pronounced material erosion, for instance, during a wet chemical cleaning process after gate patterning, may be avoided, thereby not unduly affecting the further processing, for instance with respect to forming an embedded strain-inducing semiconductor alloy, while nevertheless providing the desired etch stop capabilities during removing the silicon nitride cap material.